Physical deposition system ORION-8 (AJA International) consists of 3 ultra-high vacuum chambers which accommodate magnetron sputtering, electron beam evaporation and in-vacuum analysis tools. The system is used for a deposition of thin films of various materials with the thickness of single nm to micrometers. Thin films can be deposited on heated substrates. Analysis tools such as RGA, Auger spectrometer, LEED, RHEED and growth sensor allow monitoring growth rate, crystallinity and chemical composition of the deposited films. Variety of materials can be grown in the form of single- or polycrystalline films.
Specifications and capabilities of ORION-8 system
- Sample stages accommodate 3” wafers, are rotatable and can be heated up to 850 deg C.
- Two loadlocks. Sample can be transferred between chambers.
- Pumping system based on turbomolecular pumps and a cryopump. Base vacuum 10-9 Tor.
- Six 2”in diameter magnetron sputtering guns can operate in DC or AC mode (3 at a time)
- Electron beam evaporator is equipped in five 5 cm3 pockets for materials.
- RF plasma source with the maximum power of 50 W
- 2 lines for gasses with mass controllers
- Automatic computer controlled gas switch and mass flow.
- 2 crystal growth controllers.
- Reflection High Energy Electron Diffraction System (Staib Inc.) with 50 kV gun.
- Residual Gas Analyzer system (Stanford Research Systems)
- Combination Auger /Low Energy Electron Diffraction System from OCI Microengineering Inc.