• class100Class 100 Cleanroom

    The cleanroom provides an effective environment for photolithography processes and other experiments in which dust particles may affect quality of processed or measured samples.

  • mask alignerMask Aligner and UV Exposure Station

    Photolithography equipment used for fabrication of micron sized patterns on photoresist.

  • spin coaterSpin-Coater/hotplate System

    This benchtop spin-coater and hotplate system can be readily used for the routine fabrication of thin film patterns.

  • ion millingIon Milling

    This dry etching method can be routinely used for creating thin film patterns down to the nanoscale.