Physical Deposition System - Microlayer 400

APXMicrolayer 400 System

Microlayer 400(APX Scientific Inc.) is a combination physical deposition system. Six magnetron sputtering guns and dual electron beam evaporator with 10 pockets for materials in ultra-high vacuum chamber allow depositing a large variety of materials in the form of thin films with the thickness from single nanometers to a few micrometers. Growth of single crystal and polycrystalline films deposited by sputtering or evaporation on rotating substrates is monitored using a crystal growth sensor.

User Rates

Rates will be based on an hourly or per sample basis and will be decided after consultation with the customer.

Contact Us

Dr. Leszek Malkinski
Email:lmalkins@uno.edu

Specifications and capabilities of TA Q600 TGA-DSC

  • Six 3” in diameter magnetron sputtering guns operating in DC or RF mode (up to 3 at a time)
  • Loadlock and a transfer arm.
  • Deposition controlled by the LABVIEW-based software
  • Rotatable sample stage accommodates substrates up to 4”.
  • Dual electron–beam evaporator (Thermionics) with five 2.2 cm3 pockets for materials in each evaporator.
  • Two evaporators have independent power supplies and beam sweeping systems can be run at the same time.
  • Pumping system based on a UHV cryopump. Base vacuum 10-9 Torr
  • Two gas lines with mass flow controllers. Different non-toxic gases can be used for sputtering or reactive sputtering.

Sample Data

Sample data